Updates


How do Lithography Engineers Save Time Resolving Particle Issues?

APSRQscreen-sm

Did you know?

Did you know Lithography Engineers can save 10X the time they spend identifying & resolving particle issues in Photolithographic Scanners compared to legacy methods used today?

How?

Mr. Yukinobu Hayashi, Field Application Engineer for CyberOptics will review a case study at the 22nd Symposium on Photomask and NGL Mask Technology in Yokohama, Japan on April 21st from 17:25-19:10.

Minimizing airborne particles in Photolithography semiconductor fab manufacturing applications remains a critical success factor. Stringent manufacturing requirements and a focus on maximizing yields and tool uptimes drives a need for best-in-class practices for a contamination-free process environment. Quickly identifying when and where airborne particles originate as well as the source of the contamination proves challenging with traditional surface scan reticles, in-situ or hand-held methods.

Legacy methods are not real time and they can also be time consuming and result in long delays for results. Often, unexpected particle sources go undetected or take a long time to finally identify. It can also involve tearing down the fab tool which can be costly in terms of downtime or it can involve time running a series of test reticles.

CyberOptics APSRQIn this case study, a particular photolithography tool routinely has excessive particles. The in-situ particle scanner would scan monitor reticles going in clean but would intermittently exit with significant amounts of particles of unknown origin. The particle contamination was a constant source of frustration and traditional methods of particle detection (built-in, monitor reticles and bench-top particle counters) were unsuccessful in identifying the particle source.

By contrast, CyberOptics will review the advantages of using the wireless reticle-like real-time particle counter method as a more efficient and effective means of quickly locating and troubleshooting airborne particles in real-time with the ReticleSense™ Airborne Particle Sensor Quartz (APSRQ) in Photo-lithography reticle environments. With all the necessary alignment and fiducial marks, APSRQ can be loaded directly into the scanner just like a reticle and travel the entire reticle path to detect in real-time when and where particles are occurring in scanners. It is compatible with ASML, Nikon and Canon scanners.

Take a look at our APSRQ webpage for the case study presentation.

Recent Posts

Upcoming Events

Press Releases

05. 28. 18

CyberOptics announces plans to exhibit at SEMICON West, scheduled to take place July 10-12, 2018 at the Moscone Center in San Francisco, CA. The company will demonstrate its next-generation Airborne Particle Sensor (APS3) 300mm with new ParticleSpectrum™ software in Booth #6163.

05. 09. 18

CyberOptics will lead a poster presentation during the Technical Exhibition at the European Mask and Lithography Conference (EMLC), June 19-20 in Grenoble, France.

Subscribe to our Newsletters

Sign up to receive the latest industry news and topics on semiconductor and inspection system products.

SemiCircular

Privacy Policy Email marketing by Interspire

INtroSPECT


Privacy Policy Email marketing by Interspire