How do Lithography Engineers Save Time Resolving Particle Issues?


Did you know?

Did you know Lithography Engineers can save 10X the time they spend identifying & resolving particle issues in Photolithographic Scanners compared to legacy methods used today?


Mr. Yukinobu Hayashi, Field Application Engineer for CyberOptics will review a case study at the 22nd Symposium on Photomask and NGL Mask Technology in Yokohama, Japan on April 21st from 17:25-19:10.

Minimizing airborne particles in Photolithography semiconductor fab manufacturing applications remains a critical success factor. Stringent manufacturing requirements and a focus on maximizing yields and tool uptimes drives a need for best-in-class practices for a contamination-free process environment. Quickly identifying when and where airborne particles originate as well as the source of the contamination proves challenging with traditional surface scan reticles, in-situ or hand-held methods.

Legacy methods are not real time and they can also be time consuming and result in long delays for results. Often, unexpected particle sources go undetected or take a long time to finally identify. It can also involve tearing down the fab tool which can be costly in terms of downtime or it can involve time running a series of test reticles.

CyberOptics APSRQIn this case study, a particular photolithography tool routinely has excessive particles. The in-situ particle scanner would scan monitor reticles going in clean but would intermittently exit with significant amounts of particles of unknown origin. The particle contamination was a constant source of frustration and traditional methods of particle detection (built-in, monitor reticles and bench-top particle counters) were unsuccessful in identifying the particle source.

By contrast, CyberOptics will review the advantages of using the wireless reticle-like real-time particle counter method as a more efficient and effective means of quickly locating and troubleshooting airborne particles in real-time with the ReticleSense™ Airborne Particle Sensor Quartz (APSRQ) in Photo-lithography reticle environments. With all the necessary alignment and fiducial marks, APSRQ can be loaded directly into the scanner just like a reticle and travel the entire reticle path to detect in real-time when and where particles are occurring in scanners. It is compatible with ASML, Nikon and Canon scanners.

Take a look at our APSRQ webpage for the case study presentation.

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05. 28. 18

CyberOptics announces plans to exhibit at SEMICON West, scheduled to take place July 10-12, 2018 at the Moscone Center in San Francisco, CA. The company will demonstrate its next-generation Airborne Particle Sensor (APS3) 300mm with new ParticleSpectrum™ software in Booth #6163.

05. 09. 18

CyberOptics will lead a poster presentation during the Technical Exhibition at the European Mask and Lithography Conference (EMLC), June 19-20 in Grenoble, France.

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