Best Practices in Reticle Mask Environments


 All-in-one Sensor Saves Time and Expenses While Improving Yields

CyberOptics, a leading global developer and manufacturer of high precision 3D sensing technology solutions, will present at the SPIE Photomask Technology 2015, the premier worldwide technical meeting for mask making, emerging mask technologies, and mask business on Sept. 29 – Oct 1, 2015 at the Monterey Conference Center. At Booth #404, company representatives will be demonstrating the new ReticleSense® Auto Multi Sensors (AMSR) that speed leveling, vibration and Relative Humidity (RH) measurement to help save time and expenses while increasing yields.

For these individual measurements in semiconductor fab processes, legacy methods are not real-time, can be complicated or inefficient, and can be costly when tools need to be taken off-line for various processes. The ReticleSense Auto Multi Sensor (AMSR) travels where a reticle travels and speeds up attaining multiple measurements.

A poster session on Tuesday, September 29 at 6:30 p.m. will feature Allyn Jackson, Field Application Engineer for CyberOptics, discussing the importance of particle, leveling, vibration and relative humidity control and will review the advantages of using a wireless, real-time, reticle-like device for key measurement applications in reticle mask environments that delivers on three compelling bottom lines – saving time, saving expense and improving yields.

Reticle Haze Formation Accelerated When H2O Present (1/2)

Reticle Haze Formation Accelerated When H2O Present (1/2)

Reticle Haze Formation Accelerated When H2O Present (2/2)

Reticle Haze Formation Accelerated When H2O Present (2/2)

The AMSR can measure humidity in all locations of the reticle environment. In emersion scanner environments for example, monitoring humidity is critical in reducing Reticle Haze. Haze is an adverse effect on reticles caused by a combination of Mask residue, 193nm light and H2O. AMSR can monitor humidity in the total reticle environment and detect any place where H2O is exposed to the reticle. Controlling particles, inclination, humidity and vibration are all important factors in increasing yield and reducing downtime.

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05. 09. 18

CyberOptics will lead a poster presentation during the Technical Exhibition at the European Mask and Lithography Conference (EMLC), June 19-20 in Grenoble, France.

05. 08. 18

CyberOptics will demonstrate the MRS-Enabled SQ3000 with multi-process capabilities including 3D AOI, SPI and CMM applications at SMT Nuremberg, Germany, June 5-7 at the Messe GmbH in hall 4, stand 101.

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