WaferSense® Wireless Measurement Devices


ATS

WaferSense® Auto Teaching System

ATS

  • “Sees” inside equipment to capture three dimensional offset data (x, y, and z) to quickly teach wafer transfer positions with accuracy to 100um.
  • Improves yields and lowers particulate contamination with accurate wafer hand-off calibration, proper alignment and set ups.
  • Includes TeachView™, TeachReview™ and TeachTarget™ software.
auto gapping system

WaferSense® Auto Gapping System

AGS

  • Speeds non-contact gap measurements and parallelism adjustments under vacuum for semiconductor processes such as thin-film deposition, sputtering and etch.
  • Improves uniformity, tool availability and repeatability.
  • Includes GapView™ and GapReview™ software.
ALS2V

WaferSense® Auto Leveling System 2 Vertical

ALS2V

  • Speeds setting the right inclination by measuring pitch, roll, rise overrun and vertical inclinations.
  • Quickly and accurately enables setting the same level across the tools for better process uniformity.
  • Includes LevelView™ and LevelReview™ software.
AVS

WaferSense™ Auto Vibration System

AVS

  • Monitors 3-axis accelerations and vibration to enable yield improvements by maximizing acceleration and minimizing vibration.
  • Records vibration data for easy comparison between past and present, as well as one tool to another, to reduce particles, maintenance time and cycle time.
  • Includes VibeView™ and VibeReview™ software.
Auto Multi Sensor

WaferSense® Auto Multi Sensor™

AMS

  • Speeds setting the right inclination by measuring pitch, roll, rise overrun and vertical inclinations.
  • Quickly and accurately enables setting the same level across the tools for better process uniformity.
  • Includes LevelView™ and LevelReview™ software.
APS2

WaferSense® Airborne Particle Sensor™

APS2

  • Quickly monitors, identifies and enables troubleshooting of airborne particles down to 0.15um within semiconductor process equipment and automated material handling systems.
  • Easily identifies when and where the particles originate and measures the effectiveness of cleaning adjustments and repairs in real-time.
  • Includes ParticleView™ and ParticleReview™ software.