CyberOptics to Present Yield-Improving Measurement Methods for Semiconductor Fabs at Photomask Japan
CyberOptics will present two technical posters reviewing yield-improving measurement methods for Airborne Particles and Relative Humidity (RH) in semiconductor fabs at the Photomask Japan show, April 5-7 at the Pacifico in Yokohama, Japan. The session will take place on Thursday, April 6 from 16:20 – 17:50.
“There are several limitations with legacy Airborne Particle and Relative Humidity (RH) measurement methods. For example, hand-held sensors cannot easily access all areas, can be costly with downtime required to take the tool off-line and do not provide data in real-time,” said Mr. Yukinobu Hayashi, Senior Field Applications Engineer, CyberOptics. “By contrast, wireless, reticle-like measurement devices travel where a reticle travels and can collect and display data in real-time – speeding processes and saving expense.”
Whether for diagnostics, qualification or maintenance, semiconductor fab equipment or process engineers can efficiently and effectively take measurements and make adjustments using objective and reproducible real-time data from wireless reticle-like devices.
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