CyberOptics Presents Best Practices for Monitoring Humidity in Immersion Scanner Reticle Environments
Poster session at SPIE Advanced Lithography conference highlights ways to reduce reticle haze effects; sensor saves time and expenses while improving yields
CyberOptics will present at the SPIE Advanced Lithography 2016, the premier conference for the lithography community, Feb. 21-25, 2016 at the San Jose Marriott and Convention Center, San Jose, California.
A technical poster session on Wed., Feb. 24 at 6 p.m. will feature Allyn Jackson, U.S. and Europe Sales & Field Application Engineer for CyberOptics, discussing “Best practices for monitoring humidity in immersion scanner reticle environments to reduce reticle haze effects.”
For individual measurements in semiconductor fab processes, legacy methods are not real-time, can be complicated or inefficient, and can be costly when tools need to be taken off-line for various processes. CyberOptics’ ReticleSense® Auto Multi Sensor (AMSR) can measure humidity in all locations of the reticle environment.
In immersion scanner environments for example, monitoring humidity is critical in reducing Reticle Haze. Haze is an adverse effect on reticles caused by a combination of Mask residue, 193nm light and H2O. AMSR can monitor humidity in the total reticle environment and detect any place where H2O is exposed to the reticle. AMSR speeds leveling, vibration and Relative Humidity (RH) measurement to help save significant time and expenses. Controlling particles, inclination, humidity and vibration are all important factors in increasing yield and reducing downtime.
About the CyberOptics WaferSense and ReticleSense Line
The WaferSense measurement portfolio including the Auto Leveling System (ALS), the Auto Gapping System (AGS), the Auto Vibration System (AVS), the Auto Teaching System (ATS), the Airborne Particle Sensor (APS), the next-generation Airborne Particle Sensor (APS2) and the new Auto Multi Sensor (AMS) are available in various wafer shaped form factors depending on the device, including 150mm, 200mm, 300mm and 450mm wafer sizes. The ReticleSense measurement portfolio including the Airborne Particle Sensor (APSR & APSRQ) and next-generation APS2, the Auto Leveling System (ALSR) and the new Auto Multi Sensor (AMSR) are available in a reticle shaped form factor.